Profiling of Ge(X)Si(1-X)/Si strained-layer superlattices by large-angle convergent-beam electron diffraction and electron holography

Publication Type

Conference Paper

Year of Publication

1993

Refereed Designation

Refereed

Editor

Cullis, A. G.
StatonBevan, A. E.
Hutchison, J. L.

Book Title

Microscopy of Semiconducting Materials 1993

Series Title

Institute of Physics Conference Series

Journal

Institute of Physics Conference Series

Volume

134

Pagination

513-516

ISBN

0951-32480-7503-0290-9

Accession Number

ISI:A1993BA56Y00108

Citation Key

95

Keywords

ELASTIC RELAXATION, PATTERNS

Abstract

Large-angle convergent-beam electron diffraction (LACBED) is suitable to reveal information on local strain and misfit stress relaxation of GexSi1-x/Si strained-layer superlattices (SLS) because the diffraction lines are sensitively dependent on small changes of the spacing between lattice planes. We shall demonstrate that the line shifts in a cross-sectional specimen caused by the effects of misfit strain and stress relaxation can be separated. An electron hologramtaken from a GexSi1-x/Si SLS is also presented as a preliminary result.