Profiling of Ge(X)Si(1-X)/Si strained-layer superlattices by large-angle convergent-beam electron diffraction and electron holography
Publication Type
Conference Paper
Year of Publication
1993
Refereed Designation
Refereed
Editor
Cullis, A. G.
StatonBevan, A. E.
Hutchison, J. L.
Book Title
Microscopy of Semiconducting Materials 1993
Series Title
Institute of Physics Conference Series
Journal
Institute of Physics Conference Series
Volume
134
Pagination
513-516
ISBN
0951-32480-7503-0290-9
Accession Number
ISI:A1993BA56Y00108
Citation Key
95
Keywords
ELASTIC RELAXATION, PATTERNS
Abstract
Large-angle convergent-beam electron diffraction (LACBED) is suitable to reveal information on local strain and misfit stress relaxation of GexSi1-x/Si strained-layer superlattices (SLS) because the diffraction lines are sensitively dependent on small changes of the spacing between lattice planes. We shall demonstrate that the line shifts in a cross-sectional specimen caused by the effects of misfit strain and stress relaxation can be separated. An electron hologramtaken from a GexSi1-x/Si SLS is also presented as a preliminary result.